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Optical crystals, laser substrates and objectives for IR and UV fields

Optical crystals, laser substrates and objectives for IR and UV fields

Workshop "Lenses for IR and UV field" produces lenses with spherical and aspherical surfaces, and flat-parallel plates (mirrors and substrates) working in the IR and UV fields.
The workshop has the latest generation of CNC machines for processing of optical components (Satisloh, Nanotech) and measuring equipment (Zygo, Mahr).

Technical Specification

Spherical and aspherical surfaces: Diameter Ø10mm - Ø180mm (spherical) Ø20mm - Ø180mm (aspherical)  Surface form ΔN – to 0,2 (spherical)and to 2 (aspherical)  Roughness (RMS) - <1nm (for ZnS items only <3nm)  Decentricity - <30”  Surface quality Ø15mm / 20-10 Ø15mm to Ø60mm / 40-20 > Ø60mm / 60 for ZnS items only / 80-50
Aspheric item made with diamond turning  Diameter Ø10mm to Ø200mm  Surface form ΔN – 0,3  Roughness (RMS) <3nm  Decentricity <30”  Surface quality up to Ø20mm / 20-10 > Ø20mm / 40-20 Diffractive surface processing capability
Plane item (mirrors Si, Ge):  Diameter Ø10mm - Ø200mm  Parallelism up to 3’  Surface form ΔN – up to 0,2  Roughness (RMS) <1nm (0,7 to 0,9nm) For ZnS only <3nm  Surface form up to Ø30mm / 20-10 Ø30mm -Ø60mm / 40-20 > Ø60mm / 60-40 For ZnS only / 80-50
Substrates (CaF2, MgF2): Diameter Ø10mm - Ø50mm  Parallelism up to 5”  Surface form ΔN – to 0,2  Roughness (RMS) <1nm (0,5 to 0,7nm) For ZnS only <3nm  Surface form – 20-10

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